User Tools

Site Tools


ncsu_180nm_process_info

This is an old revision of the document!


Design Rules and Process Information for the NCSU 180nm CMOS Technology used in the class

  • We will be using an 0.18 micron 6 Metal 1 Poly (1.8V/3.3V) CMOS technology lambda(λ) equal to 0.09 micro meters. We are using an open-source PDK from NCSU.
  • We will use the Scalable CMOS SUBM design rules for your CPEG 4/624 layouts. Note that the design rules are given in terms of lambda (=0.09u) while Cadence Virtuoso uses absolute values without any scaling. Thus in your layouts, multiply all design rule numbers by 0.09u for final layout dimensions. E.g. the minimum N-well width of 12 translates into 12*0.09u=1.08u in Virtuoso layout.

Process Parameters

                                       
                         MOSIS WAFER ACCEPTANCE TESTS
                                       
        RUN: T68B (MM_NON-EPI)                            VENDOR: TSMC
 TECHNOLOGY: SCN018                                FEATURE SIZE: 0.18 microns
                                Run type: SKD

INTRODUCTION: This report contains the lot average results obtained by MOSIS

            from measurements of MOSIS test structures on each wafer of
            this fabrication lot. SPICE parameters obtained from similar
            measurements on a selected wafer are also attached.

COMMENTS: DSCN6M018_TSMC

TRANSISTOR PARAMETERS W/L N-CHANNEL P-CHANNEL UNITS

MINIMUM 0.27/0.18

Vth                                    0.50     -0.51  volts
                                                      

SHORT 20.0/0.18

Idss                                 547      -250     uA/um
Vth                                    0.51     -0.51  volts
Vpt                                    4.8      -5.6   volts
                                                      

WIDE 20.0/0.18

Ids0                                  14.4      -4.7   pA/um
                                                      

LARGE 50/50

Vth                                    0.43     -0.42  volts
Vjbkd                                  3.1      -4.3   volts
Ijlk                                 <50.0     <50.0   pA
                                                      

K' (Uo*Cox/2) 175.4 -35.6 uA/V^2 Low-field Mobility 416.52 84.54 cm^2/V*s

COMMENTS: Poly bias varies with design technology. To account for mask

         bias use the appropriate value for the parameters XL and XW
         in your SPICE model card.
                     Design Technology                   XL (um)  XW (um)
                     -----------------                   -------  ------
                     SCN6M_DEEP (lambda=0.09)             0.00    -0.01
                                   thick oxide            0.00    -0.01
                     SCN6M_SUBM (lambda=0.10)            -0.02     0.00
                                   thick oxide           -0.02     0.00

FOX TRANSISTORS GATE N+ACTIVE P+ACTIVE UNITS Vth Poly >6.6 ←6.6 volts

PROCESS PARAMETERS N+ P+ POLY N+BLK PLY+BLK M1 M2 UNITS Sheet Resistance 6.7 7.8 8.0 59.7 313.6 0.08 0.08 ohms/sq Contact Resistance 10.6 11.0 10.0 4.79 ohms Gate Oxide Thickness 41 angstrom

PROCESS PARAMETERS M3 POLY_HRI M4 M5 M6 N_W UNITS Sheet Resistance 0.08 0.08 0.08 0.03 930 ohms/sq Contact Resistance 9.24 14.05 18.39 20.69 ohms

COMMENTS: BLK is silicide block.

CAPACITANCE PARAMETERS N+ P+ POLY M1 M2 M3 M4 M5 M6 R_W D_N_W M5P N_W UNITS Area (substrate) 942 1163 106 34 14 9 6 5 3 123 125 aF/um^2 Area (N+active) 8484 55 20 13 11 9 8 aF/um^2 Area (P+active) 8232 aF/um^2 Area (poly) 66 17 10 7 5 4 aF/um^2 Area (metal1) 37 14 9 6 5 aF/um^2 Area (metal2) 35 14 9 6 aF/um^2 Area (metal3) 37 14 9 aF/um^2 Area (metal4) 36 14 aF/um^2 Area (metal5) 34 984 aF/um^2 Area (r well) 920 aF/um^2 Area (d well) 582 aF/um^2 Area (no well) 137 aF/um^2 Fringe (substrate) 212 235 41 35 29 21 14 aF/um Fringe (poly) 70 39 29 23 20 17 aF/um Fringe (metal1) 52 34 22 19 aF/um Fringe (metal2) 48 35 27 22 aF/um Fringe (metal3) 53 34 27 aF/um Fringe (metal4) 58 35 aF/um Fringe (metal5) 55 aF/um Overlap (N+active) 895 aF/um Overlap (P+active) 737 aF/um

CIRCUIT PARAMETERS UNITS Inverters K

Vinv                        1.0       0.74  volts      
Vinv                        1.5       0.78  volts      
Vol (100 uA)                2.0       0.08  volts      
Voh (100 uA)                2.0       1.63  volts      
Vinv                        2.0       0.82  volts      
Gain                        2.0     -23.72             

Ring Oscillator Freq.

D1024_THK (31-stg,3.3V)             300.36  MHz        
DIV1024 (31-stg,1.8V)               363.77  MHz        

Ring Oscillator Power

D1024_THK (31-stg,3.3V)               0.07  uW/MHz/gate
DIV1024 (31-stg,1.8V)                 0.02  uW/MHz/gate
                                                       
ncsu_180nm_process_info.1599058119.txt.gz · Last modified: 2020/09/02 14:48 by vsaxena